專利名稱：Solid precursor injector apparatus發(fā)明人：David R. Atwell申請?zhí)枺篣S09/375077申請日：19990816公開號：US06072939A公開日：20000606

摘要：An apparatus and method are provided for effectively and controllably

vaporizing solid material, in general, and specifically, solid precursor material for chemicalphase deposition processes. The apparatus includes a hollow container member, capableof retaining solid material and having a longitudinal axis passing through a substantiallyopen first end, that is reciprocally injected at a controlled rate through a heater capableof vaporizing the solid material so that vaporized material passes through the first endalong the longitudinal axis of the container member and into the reaction chamber.Preferably, the apparatus includes a hollow body capable of pressure containment that isin fluid communication with the reaction chamber and an rod- shaped injector slidablydisposed through the hollow body suitable for injecting the container member throughthe body and the injector is driven external to the body using a stepper motor. It is alsopreferred that the body have first and second sections consisting of a load lock and atubing member, respectively, that can be isolated through the use of a gate valve.Preferably, the container member also includes a removable cap that is capable ofsealing and retaining solid CVD precursor material in the container member and amoveable arm is provided through the load lock for engaging the cap to allow for itsremoval from the container member. Preferably, the container member is horizontally

injected through a heater chamber into an inlet port in a reaction chamber.

申請人：MICRON TECHNOLOGY, INC.

代理機(jī)構(gòu)：Kirkpatrick & Lockhart LLP

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