專利名稱：Nano-gap grating devices with enhanced

optical properties and methods offabrication

發(fā)明人：Shubhra Gangopadhyay,Venu

Korampally,Sagnik Basuray,Kunal

Bhatnagar,Avinash Pathak,Arnab Ghosh,DrewEdwin Menke,Joseph Mathai,Peter

Cornish,Keshab Gangopadhyay,Aaron Wood

申請(qǐng)?zhí)枺篣S14081353申請(qǐng)日：20131115公開號(hào)：US10073200B2公開日：20180911

專利附圖：

摘要：A method of producing a grating structure comprises the steps of forming astamp from flexible plastic material, the stamp including a negative of a periodic gratingpattern on a first surface; forming an ink by applying a polymer film to the stamp, the inkincluding a first surface and an opposing second surface, wherein the first surface of theink contacts the first surface of the stamp such that the ink retains a positive of theperiodic grating pattern; placing the ink and the stamp on a substrate such that thesecond surface of the ink contacts an upper surface of the substrate; and removing thestamp from the ink by applying a tensional force to one edge of the stamp.

申請(qǐng)人：The Curators of the University of Missouri

地址：Columbia MO US

國籍：US

代理機(jī)構(gòu)：Erise IP, P.A.

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